KARAKTERISASI REAKTOR PLASMA CVD UNTUK DEPOSISI DIAMOND-LIKE CARBON COATING

Putut Marwoto

Abstract


Kertas kerja ini melaporkan karakterisasi reaktor plasma CVD yang telah dirancang bangun dengan catu daya DC untuk deposisi film tipis DLC dengan gas metana (CH4) dan argon (Ar) sebagai sumber gas.Hasil eksperimen menunjukkan bahwa tegangan operasi plasma dipengaruhi oleh tekanan reaktor, laju lairan gas, jenis gas,  komposisi campuran gas CH4 dan argon, jarak elektroda dan suhu katoda.

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References


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